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Thin Films for Optical Waveguide Devices and Materials for Optical Limiting: Volume 597 (MRS Proceedings) - Hardcover

 
9781558995055: Thin Films for Optical Waveguide Devices and Materials for Optical Limiting: Volume 597 (MRS Proceedings)
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This book, first published in 2000, provides a multidisciplinary discussion of the science and technology of optical materials and devices for materials scientists, chemists, and physicists. Symposium Z, Thin Films for Optical Waveguide Devices, covers materials properties, thin-film processing and optical waveguide device integration. The range of thin films include ferroelectrics, dielectrics, glasses, and polymers with epitaxial, glass, or polymeric structures. Discussions of thin-film processing include sputtering, MBE, PLD, MOCVD, FHD, sol-gel, and spin casting for luminescent waveguides, electro-optic waveguides, magneto-optic waveguides, and photonic crystals. Symposium PP, Materials for Optical Limiting II, addresses the development of materials for optical limiters and tunable filters which can suppress undesired radiation. Topics include two-photon absorbers and photorefractives, as well as continued emphasis on reverse saturable absorption, liquid crystals, and carbon-based suspensions. It also covers new materials modeling and synthesis, nonlinear materials characterization, device applications using new materials and analyses of materials impact on optical limiting applications.

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This book, first published in 2000, provides a multidisciplinary discussion of the science and technology of optical materials and devices for materials scientists, chemists, and physicists. Symposium Z, Thin Films for Optical Waveguide Devices, covers materials properties, thin-film processing and optical waveguide device integration.

"About this title" may belong to another edition of this title.

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9781107413283: Thin Films for Optical Waveguide Devices and Materials for Optical Limiting: Volume 597 (MRS Proceedings)

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ISBN 10:  1107413281 ISBN 13:  9781107413283
Publisher: Cambridge University Press, 2014
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KEIICHI NASHIMOTO, FUJI XEROX CO. LTD., JAPANRUTH PACHTER, AIR FORCE RESEARCH LABORATORY, U.S.A.BRUCE W. WESSELS, NORTHWESTERN UNIVERSITY, ILLINOISJOSEPH SHMULOVICH, LUCENT TECHNOLOGIES, NEW JERSEYALEX -K. -Y. JEN, UNIVERSITY OF WASHINGTONKEITH LEWIS, DEFENCE EVALUATION AND RESEARCH AGENCY, WORCESTERSHIRERICHARD SUTHERLAND, SCIENCE APPLICATIONS INTERNATIONAL CORP.JOSEPH W. PERRY, UNIVERSITY OF ARIZONA
Published by Cambridge University Press (2000)
ISBN 10: 1558995056 ISBN 13: 9781558995055
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